Preparation and properties of RF sputtered indium-tin oxide thin films for applications as heat mirrors in photothermal solar energy conversion
Identifieur interne : 007264 ( Main/Repository ); précédent : 007263; suivant : 007265Preparation and properties of RF sputtered indium-tin oxide thin films for applications as heat mirrors in photothermal solar energy conversion
Auteurs : RBID : Pascal:07-0501159Descripteurs français
- Pascal (Inist)
- Dépôt pulvérisation, Couche mince, Miroir, Conversion énergie, Pulvérisation haute fréquence, Pulvérisation réactive, Dépôt physique phase vapeur, Pulvérisation irradiation, Microstructure, Microscopie électronique transmission, Diffraction électron sélection aire, Propriété optique, Energie solaire, Spectrométrie IR, Indium oxyde, Etain oxyde, Titane nitrure, Ellipsométrie, Facteur transmission, Traitement thermique, Revêtement optique, In, TiN, 8115C, 6855J, 7866.
English descriptors
- KwdEn :
- Ellipsometry, Energy conversion, Heat treatments, Indium oxides, Infrared spectroscopy, Microstructure, Mirrors, Optical coatings, Optical properties, Physical vapor deposition, Radiofrequency sputtering, Reactive sputtering, SAED, Solar energy, Sputter deposition, Sputtering, Thin films, Tin oxides, Titanium nitrides, Transmission electron microscopy, Transmittance.
Abstract
In the present research, in order to deposit indium-tin oxide (ITO) thin films the method of RF reactive sputtering was used. Sputtering of two types indium-tin targets in the presence of oxygen as reactive gas was made. The technological parameters were optimized to obtain films with good quality on different substrates. The films' microstructure was studied by TEM and SAED. To identify the optical properties of the films the methods of infrared spectrometry and laser ellipsometry were used. UV-VIS spectrophotometry showed the high visible transmittance of the RF sputtered ITO films. Heating of the substrates during the films sputtering and their post deposition thermal treatment also were studied. The ultimate goal of the present research activities was to develop new technological processes leading to low-cost, highly effective optical coatings for application in photo thermal solar energy conversion and utilization.
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Preparation and properties of RF sputtered indium-tin oxide thin films for applications as heat mirrors in photothermal solar energy conversion</title><author><name sortKey="Boiadjiev, Stefan I" uniqKey="Boiadjiev S">Stefan I. Boiadjiev</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Technical University of Sofia, 8 Kl. Ohridski Blvd</s1><s2>1756 Sofia</s2><s3>BGR</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Bulgarie</country><placeName><settlement type="city">Sofia</settlement><region nuts="2">Sofia-ville (oblast)</region></placeName></affiliation></author><author><name sortKey="Dobrikov, Georgi H" uniqKey="Dobrikov G">Georgi H. Dobrikov</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Technical University of Sofia, 8 Kl. Ohridski Blvd</s1><s2>1756 Sofia</s2><s3>BGR</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Bulgarie</country><placeName><settlement type="city">Sofia</settlement><region nuts="2">Sofia-ville (oblast)</region></placeName></affiliation></author><author><name sortKey="Rassovska, Milka M M" uniqKey="Rassovska M">Milka M. M. Rassovska</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Technical University of Sofia, 8 Kl. Ohridski Blvd</s1><s2>1756 Sofia</s2><s3>BGR</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Bulgarie</country><placeName><settlement type="city">Sofia</settlement><region nuts="2">Sofia-ville (oblast)</region></placeName></affiliation></author></titleStmt><publicationStmt><idno type="inist">07-0501159</idno><date when="2007">2007</date><idno type="stanalyst">PASCAL 07-0501159 INIST</idno><idno type="RBID">Pascal:07-0501159</idno><idno type="wicri:Area/Main/Corpus">007208</idno><idno type="wicri:Area/Main/Repository">007264</idno></publicationStmt><seriesStmt><idno type="ISSN">0040-6090</idno><title level="j" type="abbreviated">Thin solid films</title><title level="j" type="main">Thin solid films</title></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Ellipsometry</term><term>Energy conversion</term><term>Heat treatments</term><term>Indium oxides</term><term>Infrared spectroscopy</term><term>Microstructure</term><term>Mirrors</term><term>Optical coatings</term><term>Optical properties</term><term>Physical vapor deposition</term><term>Radiofrequency sputtering</term><term>Reactive sputtering</term><term>SAED</term><term>Solar energy</term><term>Sputter deposition</term><term>Sputtering</term><term>Thin films</term><term>Tin oxides</term><term>Titanium nitrides</term><term>Transmission electron microscopy</term><term>Transmittance</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>Dépôt pulvérisation</term><term>Couche mince</term><term>Miroir</term><term>Conversion énergie</term><term>Pulvérisation haute fréquence</term><term>Pulvérisation réactive</term><term>Dépôt physique phase vapeur</term><term>Pulvérisation irradiation</term><term>Microstructure</term><term>Microscopie électronique transmission</term><term>Diffraction électron sélection aire</term><term>Propriété optique</term><term>Energie solaire</term><term>Spectrométrie IR</term><term>Indium oxyde</term><term>Etain oxyde</term><term>Titane nitrure</term><term>Ellipsométrie</term><term>Facteur transmission</term><term>Traitement thermique</term><term>Revêtement optique</term><term>In</term><term>TiN</term><term>8115C</term><term>6855J</term><term>7866</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">In the present research, in order to deposit indium-tin oxide (ITO) thin films the method of RF reactive sputtering was used. Sputtering of two types indium-tin targets in the presence of oxygen as reactive gas was made. The technological parameters were optimized to obtain films with good quality on different substrates. The films' microstructure was studied by TEM and SAED. To identify the optical properties of the films the methods of infrared spectrometry and laser ellipsometry were used. UV-VIS spectrophotometry showed the high visible transmittance of the RF sputtered ITO films. Heating of the substrates during the films sputtering and their post deposition thermal treatment also were studied. The ultimate goal of the present research activities was to develop new technological processes leading to low-cost, highly effective optical coatings for application in photo thermal solar energy conversion and utilization.</div></front></TEI><inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0040-6090</s0></fA01><fA02 i1="01"><s0>THSFAP</s0></fA02><fA03 i2="1"><s0>Thin solid films</s0></fA03><fA05><s2>515</s2></fA05><fA06><s2>24</s2></fA06><fA08 i1="01" i2="1" l="ENG"><s1>Preparation and properties of RF sputtered indium-tin oxide thin films for applications as heat mirrors in photothermal solar energy conversion</s1></fA08><fA09 i1="01" i2="1" l="ENG"><s1>First International Symposium on Transparent Conducting Oxides: 1st IS TCO 2006</s1></fA09><fA11 i1="01" i2="1"><s1>BOIADJIEV (Stefan I.)</s1></fA11><fA11 i1="02" i2="1"><s1>DOBRIKOV (Georgi H.)</s1></fA11><fA11 i1="03" i2="1"><s1>RASSOVSKA (Milka M. M.)</s1></fA11><fA12 i1="01" i2="1"><s1>KIRIAKIDIS (George)</s1><s9>ed.</s9></fA12><fA12 i1="02" i2="1"><s1>BARATON (Marie-Isabelle)</s1><s9>ed.</s9></fA12><fA12 i1="03" i2="1"><s1>MAO (Samuel)</s1><s9>ed.</s9></fA12><fA14 i1="01"><s1>Technical University of Sofia, 8 Kl. Ohridski Blvd</s1><s2>1756 Sofia</s2><s3>BGR</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></fA14><fA15 i1="01"><s1>Physics Dpt. Univ. of Crete, IESL/FORTH, Voutes, PO Box 1385</s1><s2>Heraklion 71110 Crete</s2><s3>GRC</s3><sZ>1 aut.</sZ></fA15><fA15 i1="02"><s1>University of Limoges</s1><s3>FRA</s3><sZ>2 aut.</sZ></fA15><fA15 i1="03"><s1>University of Berkeley-California</s1><s3>USA</s3><sZ>3 aut.</sZ></fA15><fA20><s1>8465-8468</s1></fA20><fA21><s1>2007</s1></fA21><fA23 i1="01"><s0>ENG</s0></fA23><fA43 i1="01"><s1>INIST</s1><s2>13597</s2><s5>354000143469600070</s5></fA43><fA44><s0>0000</s0><s1>© 2007 INIST-CNRS. All rights reserved.</s1></fA44><fA45><s0>10 ref.</s0></fA45><fA47 i1="01" i2="1"><s0>07-0501159</s0></fA47><fA60><s1>P</s1><s2>C</s2></fA60><fA61><s0>A</s0></fA61><fA64 i1="01" i2="1"><s0>Thin solid films</s0></fA64><fA66 i1="01"><s0>CHE</s0></fA66><fC01 i1="01" l="ENG"><s0>In the present research, in order to deposit indium-tin oxide (ITO) thin films the method of RF reactive sputtering was used. Sputtering of two types indium-tin targets in the presence of oxygen as reactive gas was made. The technological parameters were optimized to obtain films with good quality on different substrates. The films' microstructure was studied by TEM and SAED. To identify the optical properties of the films the methods of infrared spectrometry and laser ellipsometry were used. UV-VIS spectrophotometry showed the high visible transmittance of the RF sputtered ITO films. Heating of the substrates during the films sputtering and their post deposition thermal treatment also were studied. The ultimate goal of the present research activities was to develop new technological processes leading to low-cost, highly effective optical coatings for application in photo thermal solar energy conversion and utilization.</s0></fC01><fC02 i1="01" i2="3"><s0>001B80A15C</s0></fC02><fC02 i1="02" i2="3"><s0>001B60H55J</s0></fC02><fC02 i1="03" i2="3"><s0>001B70H66</s0></fC02><fC03 i1="01" i2="3" l="FRE"><s0>Dépôt pulvérisation</s0><s5>01</s5></fC03><fC03 i1="01" i2="3" l="ENG"><s0>Sputter deposition</s0><s5>01</s5></fC03><fC03 i1="02" i2="3" l="FRE"><s0>Couche mince</s0><s5>02</s5></fC03><fC03 i1="02" i2="3" l="ENG"><s0>Thin films</s0><s5>02</s5></fC03><fC03 i1="03" i2="3" l="FRE"><s0>Miroir</s0><s5>03</s5></fC03><fC03 i1="03" i2="3" l="ENG"><s0>Mirrors</s0><s5>03</s5></fC03><fC03 i1="04" i2="3" l="FRE"><s0>Conversion énergie</s0><s5>04</s5></fC03><fC03 i1="04" i2="3" l="ENG"><s0>Energy conversion</s0><s5>04</s5></fC03><fC03 i1="05" i2="X" l="FRE"><s0>Pulvérisation haute fréquence</s0><s5>05</s5></fC03><fC03 i1="05" i2="X" l="ENG"><s0>Radiofrequency sputtering</s0><s5>05</s5></fC03><fC03 i1="05" i2="X" l="SPA"><s0>Pulverización alta frecuencia</s0><s5>05</s5></fC03><fC03 i1="06" i2="3" l="FRE"><s0>Pulvérisation réactive</s0><s5>06</s5></fC03><fC03 i1="06" i2="3" l="ENG"><s0>Reactive sputtering</s0><s5>06</s5></fC03><fC03 i1="07" i2="3" l="FRE"><s0>Dépôt physique phase vapeur</s0><s5>07</s5></fC03><fC03 i1="07" i2="3" l="ENG"><s0>Physical vapor deposition</s0><s5>07</s5></fC03><fC03 i1="08" i2="3" l="FRE"><s0>Pulvérisation irradiation</s0><s5>08</s5></fC03><fC03 i1="08" i2="3" l="ENG"><s0>Sputtering</s0><s5>08</s5></fC03><fC03 i1="09" i2="3" l="FRE"><s0>Microstructure</s0><s5>09</s5></fC03><fC03 i1="09" i2="3" l="ENG"><s0>Microstructure</s0><s5>09</s5></fC03><fC03 i1="10" i2="3" l="FRE"><s0>Microscopie électronique transmission</s0><s5>10</s5></fC03><fC03 i1="10" i2="3" l="ENG"><s0>Transmission electron microscopy</s0><s5>10</s5></fC03><fC03 i1="11" i2="3" l="FRE"><s0>Diffraction électron sélection aire</s0><s5>11</s5></fC03><fC03 i1="11" i2="3" l="ENG"><s0>SAED</s0><s5>11</s5></fC03><fC03 i1="12" i2="3" l="FRE"><s0>Propriété optique</s0><s5>12</s5></fC03><fC03 i1="12" i2="3" l="ENG"><s0>Optical properties</s0><s5>12</s5></fC03><fC03 i1="13" i2="3" l="FRE"><s0>Energie solaire</s0><s5>13</s5></fC03><fC03 i1="13" i2="3" l="ENG"><s0>Solar energy</s0><s5>13</s5></fC03><fC03 i1="14" i2="3" l="FRE"><s0>Spectrométrie IR</s0><s5>14</s5></fC03><fC03 i1="14" i2="3" l="ENG"><s0>Infrared spectroscopy</s0><s5>14</s5></fC03><fC03 i1="15" i2="3" l="FRE"><s0>Indium oxyde</s0><s2>NK</s2><s5>15</s5></fC03><fC03 i1="15" i2="3" l="ENG"><s0>Indium oxides</s0><s2>NK</s2><s5>15</s5></fC03><fC03 i1="16" i2="3" l="FRE"><s0>Etain oxyde</s0><s2>NK</s2><s5>16</s5></fC03><fC03 i1="16" i2="3" l="ENG"><s0>Tin oxides</s0><s2>NK</s2><s5>16</s5></fC03><fC03 i1="17" i2="3" l="FRE"><s0>Titane nitrure</s0><s2>NK</s2><s5>17</s5></fC03><fC03 i1="17" i2="3" l="ENG"><s0>Titanium nitrides</s0><s2>NK</s2><s5>17</s5></fC03><fC03 i1="18" i2="3" l="FRE"><s0>Ellipsométrie</s0><s5>29</s5></fC03><fC03 i1="18" i2="3" l="ENG"><s0>Ellipsometry</s0><s5>29</s5></fC03><fC03 i1="19" i2="X" l="FRE"><s0>Facteur transmission</s0><s5>30</s5></fC03><fC03 i1="19" i2="X" l="ENG"><s0>Transmittance</s0><s5>30</s5></fC03><fC03 i1="19" i2="X" l="SPA"><s0>Factor transmisión</s0><s5>30</s5></fC03><fC03 i1="20" i2="3" l="FRE"><s0>Traitement thermique</s0><s5>31</s5></fC03><fC03 i1="20" i2="3" l="ENG"><s0>Heat treatments</s0><s5>31</s5></fC03><fC03 i1="21" i2="3" l="FRE"><s0>Revêtement optique</s0><s5>32</s5></fC03><fC03 i1="21" i2="3" l="ENG"><s0>Optical coatings</s0><s5>32</s5></fC03><fC03 i1="22" i2="3" l="FRE"><s0>In</s0><s4>INC</s4><s5>46</s5></fC03><fC03 i1="23" i2="3" l="FRE"><s0>TiN</s0><s4>INC</s4><s5>47</s5></fC03><fC03 i1="24" i2="3" l="FRE"><s0>8115C</s0><s4>INC</s4><s5>71</s5></fC03><fC03 i1="25" i2="3" l="FRE"><s0>6855J</s0><s4>INC</s4><s5>72</s5></fC03><fC03 i1="26" i2="3" l="FRE"><s0>7866</s0><s4>INC</s4><s5>73</s5></fC03><fN21><s1>330</s1></fN21></pA><pR><fA30 i1="01" i2="1" l="ENG"><s1>IS-TCO 2006 : International Symposium on Transparent Conducting Oxides</s1><s2>1</s2><s3>Island of Crete GRC</s3><s4>2006-10-23</s4></fA30></pR></standard></inist></record>Pour manipuler ce document sous Unix (Dilib)
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